The spin coater is a part of the Solitec 5110 wafer processing bench, intended for spincoating of photoresist. It has a control panel where you choose the number of steps and the time and speed for each step (normally a spread and a spin step, speed and time depending on which photoresist that is used) Also several different chucks are available. If replacing the absorbing wipes inside the shroud make sure that the ventilation hole to the right of the center axle hole is not covered and when placing the shroud back check that the drain/ventilation pipe is not blocked. During spincoating there is a top cover to place on the spin coater to reduce the amount of solvent fumes  released during the process, when process is finished leave the top cover in place for the same reason.