Picture of Laurell spin coater
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The Laurell WS-650-23 B spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer). It has a standard chuck for 50-150mm wafers and two add-on adapters for 10-50mm and 5-25mm samples. Remember to open fumehood valves for vacuum and pressurized air (CDA) before using the spincoater, also close them after you are done.

Tool name:
Laurell spin coater
Area/room:
ChL_Synthesis lab 1, labroom 1 (G272)
Category:
Thin film deposition
Manufacturer:
Laurell
Model:
WS650Mz-23NPP

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