Introduction

The UVO-CLEANER, Model PSD-UV8 with 9" x 9" stage capacity produces near-atomically clean surfaces in less than one minute by utilizing the UV/Ozone cleaning method. This process effectively and thoroughly removes an assortment of organic contaminants from surfaces. These contaminants include human skin oils, silicone oils, solder flux, residues from wet cleaning processes or water residue, contamination absorbed during prolonged exposure to air, and many others.
For optimum results, the surfaces of the samples must be preplanned to remove contaminants such as dust and inorganic salts, which cannot be changed into volatile molecules by oxidation. To maximize the cleaning rate, samples should be placed as close to the UV source as possible. 

Safety

Read the user manual carefully before use. The equipment generates ozone which is very reactive and harmful.