Eitre 6: it is a semi-automated nanolithography tool for substrate sizes up to 8” x 8”, allowing pattern replication on the micro- and nanometre scale. The imprint pressure could be 6 to 80 bar, at a maximum temperature of 250? (200? with UV module).

The flexibility of the tool allows for a variety of imprint processes to be used, such as hot embossing, thermal NIL, UV NIL and Obducat’s unique Simultaneous Thermal and UV (STU^®) process.

The tool can be used with IPS^® technology that is based on making a replication of the master stamp into a soft Intermediate Polymer Stamp (IPS^®). The IPS ^® is then used in a second imprint step to transfer the structures onto the target substrate. The IPS^® enables contamination control, increases the master stamp lifetime and makes the imprint process less sensitive to substrate contaminations and surface roughness.